AbstractsChemistry
Atomic Layer Deposition of TaN, NbN, and MoN Films for Cu Metallizations
| Institution: | University of Helsinki |
|---|---|
| Department: | Department of Chemistry; Helsingfors universitet, matematisk-naturvetenskapliga fakulteten, kemiska institutionen |
| Year: | 2005 |
| Record ID: | 1136801 |
| Full text PDF: | http://hdl.handle.net/10138/21062 |
Abstract
