AbstractsPhysics

Abstract

This thesis describes a novel technique of extreme ultraviolet (EUV) lithography. A compact nanofabrication system that combines Talbot lithography and a table top extreme ultraviolet laser illumination is presented. The lithographic method based on the Talbot effect provides a robust and simple experimental setup that is capable to print arbitrary periodic structures over millimeter square areas free of defects. Test structures were printed and metalized by ion beam etching system which was rebuilt and calibrated as part of this work. The results demonstrate that a complete coherent extreme ultraviolet lithographic process based on a table top system has the capability to fabricate functional periodic metallic nanostructures. Preliminary results and prospects for future work are also presented at the end of this thesis.